描述

Keana ref 防UV 化妝底霜

防UV 化妝底霜
skin control base (25ml) SPF25PA++

code: 4582118956012

It doesn’t fill in the opened or sagged pour.
– Reflex skin finish
Pore and dullness are obscured by the magic of light like the reflex board (light reflector) which a   professional photographer also uses by camera photography.

– Tightening pore and skin
Contains tightening ingredient arch chalk leaf extract.
Contains Vitamin-C-derivatives.

– Waterproof
Sweat and waterproof.
It can be washed with soap or cleansing cream.

– Nonchemical UV cut
Since ultraviolet rays are scattered about and ultraviolet rays are blocked, a burden is not applied to  skin.

(Ultraviolet absorber disuse)
SPF25,PA++

作用:
使光線分散於面部, 令毛孔變得難以察覺可以減少化妝, 改善孔粗大外觀問題 並不會堵塞毛孔 收細毛孔, 讓皮膚看起來更細膩

光反射護膚遮瑕效果令毛孔變得難以察覺, 提升膚色並令膚色變得均勻 (專業攝影常用的修飾技巧)
含有緊緻肌膚成分- arch chalk leaf extract

含有維他命C誘導體

防水, 不易因流汗而剝落; 能以潔面乳液清洗

SPF25PA++
不含紫外線吸收劑, 光反射效果有效阻擋紫外線接觸皮膚